Lu Yongxiang(left) and Jiang Ying(right) attended the ceremony

 

On September 30, the opening ceremony of the First National Outstanding Invention Patent and Innovation Exhibition was held in China Science and Technology Museum in Beijing. Lu Yongxiang, Vice Chairman of the Standing Committee of the National People's Congress, Du Xiangwan, Vice President of Chinese Academy of Engineering (CAE), Yuan Zhengmin, Vice Chairman of the Chinese Association of Science and Technology (CAST), Jiang Ying, Member of the Standing Committee of the National People's Congress and Honorable Chairwoman of the Patent Protection Association of China (PPAC), Li Zhigang, Secretary-General of Chinese Academy of Sciences (CAS) and Zhang Qin, Deputy Commissioner of SIPO attended the ceremony.

 

Sponsored by SIPO, CAS, CAE and CAST, the First National Outstanding Invention Patent and Innovation Exhibition was organized by PPAC and China Science and Technology Museum from September 30, 2007 to January 25, 2008 at the Exhibition Hall C (Children's Science Paradise) of the museum.

 

On the basis of the two activities of "Examining and Exhibiting the Engineering Technologies of China's Outstanding Patents" jointly held by SIPO, CAS, CAE and CAST in August 2005 and May 2007, the examination panel carefully examined all the recommended items and finally selected 124 representative patented engineering technologies from 228 items under the principles of equity, justice and transparency and following the guidelines of granted patent being industrialized, combining technological innovation with economic and social benefits and being successfully promoted in markets.

 

The exhibition includes the scientific and technological achievements of China's gold-medal patents and important technological inventions of information industry, fashionable innovation articles closely related to people's life, typical representatives of national innovations such as the Founder Laser Typesetting System and Chinese Five-stroke Typing Technology, which represent the beginning stage after China's establishment of patent system, and China's hi-tech achievements such as HiView chip developed by HiSense Group and Starlight multi-media chip developed Vimicro. Covering the major industries of China's national economy such as optical electronics, medicine, telecommunications, chemicals and materials, the exhibition reflects China's current level of "independent innovation, independent IPR and independent brand," the contribution the transformation from science and technology to productivity made for China's industrial development and the positive roles of sciences and technologies in improving people's life and promoting social development.

 

It is the first time for China to demonstrate its outstanding patent and technology achievements of independent IPR at such a large scale after the country established patent system in 1985. The exhibition reflects the great roles of the outstanding patented engineering technologies and industrialized scientific and technological achievements emerged after China established patent system in terms of boosting the country's social and economic life, carrying forward the spirit of promoting independent innovation, independent IPR and independent brand. The exhibition created an IPR cultural atmosphere of respecting intelligence, respecting talents, encouraging innovation and tolerating failure throughout the whole society, guiding enterprises to establish new industrial structures and improve their core competence under the spirit of "three independents."

 

 

2007-10-10

2007-10-10