Sino-U.S. Symposium on Patent Application and Protection Held in Hangzhou

 

The Sino-U.S. Symposium on Patent Application and Protection is recently held in Hangzhou. More than 150 people from SIPO International Cooperation Department, the U.S. Consulate-General in Shanghai, the U.S. Patent and Trademark Office, IP administrative departments of Zhejiang Province, enterprises and agencies attend the symposium.

At the symposium, the Chinese and U.S. experts and scholars introduce the patent application, invalidation, reexamination, protection and disputes in both countries.

Sponsored by SIPO and the U.S. Patent and Trademark Office, the symposium is jointly held by Zhejiang IP Administration and the U.S. Consulate-General in Shanghai.

2013-07-17